EUV interferometric lithography for resist characterization
- Author(s):
Solak,H.H. ( Univ.of Wisconsin/Madison ) He,D. Li,W. Cerrina,F. Sohn,B.H. Yang,X.M. Nealey,P.F. - Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 278
- Page(to):
- 282
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
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