Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
- Author(s):
Farrow,R.C. ( Lucent Technologies/Bell Labs. ) Waskiewicz,W.K. Kizilyalli,I.C. Callatin,G.M. Liddle,J.A. Mkrtchyan,M.M. Kornblit,A. Ocola,L.E. Klemens,F.P. Felker,J.A. Biddick,C.J. Kraus,J.S. Blakey,M.I. Orphanos,P. Merchant,S.M. - Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 217
- Page(to):
- 226
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
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