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Heating of x-ray masks during e-beam writing

Author(s):
Krasnoperov,N.L. ( Univ.of Wi scons in/Madison )
Bansel,J.
Vladimirsky,O.
Wallace,J.P.
Vladimirsky,Y.
Cerrina,F.
1 more
Publication title:
Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3676
Pub. Year:
1999
Vol.:
Part1
Page(from):
106
Page(to):
116
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431509 [0819431508]
Language:
English
Call no.:
P63600/3676
Type:
Conference Proceedings

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