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Sub-40-nm pattern replication with ｡ﾞ20% process latitude by soft-contact x-ray lithography

Author(s):
Publication title:
Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3676
Pub. Year:
1999
Vol.:
Part1
Page(from):
70
Page(to):
78
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431509 [0819431508]
Language:
English
Call no.:
P63600/3676
Type:
Conference Proceedings

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