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Etch of gallium nitride and other III-IV materials using a novel high-density plasma configuration

Author(s):
Kuo,T.-N. ( Nano-Architect Research Corp. )
Yeh,J.-H.
Lee,H.-J.
Chen,C.-A.
Jeng,G.-K.
Lin,C.-P.
1 more
Publication title:
Optoelectronic Materials and Devices II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4078
Pub. Year:
2000
Page(from):
74
Page(to):
81
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437174 [0819437174]
Language:
English
Call no.:
P63600/4078
Type:
Conference Proceedings

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