Defect printability for sub-0.18ヲフm design rules using 193-nm lithography process and binary OPC reticle
- Author(s):
- Phan,K.A. ( Advanced Micro Devices,Inc. )
- Spence,C.A.
- Schefske,J.A.
- Okoroanyanwu,U.
- Levinson,H.J.
- Publication title:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3998
- Pub. Year:
- 2000
- Page(from):
- 773
- Page(to):
- 780
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- Language:
- English
- Call no.:
- P63600/3998
- Type:
- Conference Proceedings
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