Pitch-dependent intrafield dimensional offsets in advanced lithography
- Author(s):
- Wallace,C. ( Mitel Semiconductor )
- Martin,B.
- Arthur,G.G.
- Publication title:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3998
- Pub. Year:
- 2000
- Page(from):
- 656
- Page(to):
- 662
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- Language:
- English
- Call no.:
- P63600/3998
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Metric for process optimization on substrates with transparent stacks in optical lithography
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Optimizaion of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime
SPIE-The International Society for Optical Engineering |