Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis
- Author(s):
- Arthur,G.G. ( Rutherford Appleton Lab. )
- Martin,B.
- Wallace,C.
- Publication title:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3998
- Pub. Year:
- 2000
- Page(from):
- 631
- Page(to):
- 640
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- Language:
- English
- Call no.:
- P63600/3998
- Type:
- Conference Proceedings
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