MASK TECHNOLOGY FOR X-RAY NANOLITHOGRAPHY | 東京工業大学附属図書館文献データベース

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MASK TECHNOLOGY FOR X-RAY NANOLITHOGRAPHY

Author(s):

Schattenburg, M. L.

Ghanbari, R. A.

Smith, Henry I.

Publication title:

Materials aspects of x-ray lithography : symposium held April 12-14, 1993, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

306

Pub. Year:

1993

Page(from):

63

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992023 [1558992022]

Language:

English

Call no.:

M23500/306

Type:

Conference Proceedings

Details

TDL ID:	ZA00018463
Series ID:	PA00000011
Conf. info. (Name):	Symposium on materials aspects of x-ray lithography
Conf. info. (Number):	1993
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1993.04.12-1993.04.14

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