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Modeling of Aspect Ratio Dependent Etching in an Inductively Coupled Plasma

Author(s):
Publication title:
Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
389
Pub. Year:
1995
Page(from):
197
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992924 [1558992928]
Language:
English
Call no.:
M23500/389
Type:
Conference Proceedings

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