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A New Local Electronic Stopping Model for the Monte Carlo Simulation of Arsenic Ion Implantation into (100) Single-Crystal Silicon

Author(s):
Yang, S.-H.
Morris, S.
Tian, S.
Parab, K.
Tasch, A. F.
Echenique, P. M.
Capaz, R.
Joannopoulos, J.
3 more
Publication title:
Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
389
Pub. Year:
1995
Page(from):
77
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992924 [1558992928]
Language:
English
Call no.:
M23500/389
Type:
Conference Proceedings

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