Conducting poly(aniline-co-N-propanesulfonic acid aniline)(PAPSAH)as charge dissipation layer for e-beam lithography
- Author(s):
Shy,S.L. ( National Nano Device Lab. ) Chao,T.S. Lei,T.F. Chen,S.A. Loong,W.A. Chang,C.Y. - Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 454
- Page(to):
- 465
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
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