Application of deep-UV attenuated PSM to 0.2-ヲフm contact hole patterning technology
- Author(s):
- Lee,I.-H. ( Hyundai Electronics Industries Co.,Ltd. )
- Kim,S.-M.
- Ahn,C.-N.
- Biak,K.-H.
- Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 392
- Page(to):
- 402
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Practical implementation of alternating PSM to memory device of sub-0.25-ヲフm technology
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Simulation and modeling of electron-beam lithography for delineating 0.2-ヲフm line and space patterns
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
0.35-ヲフm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
High-transmittance rim-type attenuated phase-shift masks for sub-0.2-ヲフm hole patterns
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Process issues of sub-0.20-ヲフm contact hole patterns for logic devices and DRAM
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
New mask having functions of OAI and PSM to realize sub-0.2-ヲフm patterns with 248 nm in microlithography
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Resist and oxide thickness effect on process window for 0.2-ヲフm contact patterns with off-axis illumination and attenuated phase-shift mask
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |