Overlay can be improved by self-calibrated XY measuring instrument:a lattice perspective

Author(s):

• Raugh,M.R. ( Interconnect Technologies Corp. )
• Rizvi,S.A.

Publication title:

16th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2884

Pub. Year:

1996

Page(from):

379

Page(to):

391

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422828 [0819422827]

Language:

English

Call no.:

P63600/2884

Type:

Conference Proceedings