Plasma etching of Cr films in the fabrication of photomasks:II.a comparison of etch technologies and a first look at defects
- Author(s):
- Coleman,T.P. ( Etec Systems,Inc )
- Buck,P.D.
- Johnson,D.J.
- Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 92
- Page(to):
- 102
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
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