Process optimization for thin resists for advanced e-beam reticle fabrication
- Author(s):
- Kobayashi,H. ( HOYA Crop. )
- Higuchi,T.
- Yamashiro,K.
- Askawa,K.
- Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 67
- Page(to):
- 82
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
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