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Plasma-induced oxide contamination in a 0.35-ｦﾌm CMOS process

Author(s):
Karnett,M.P. ( VLSI Technology,Inc. )
Zhou,J.
Ghosh,S.
Echtle,D.
Fritz,L.
Manley,M.
Scott,G.
2 more
Publication title:
Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2874
Pub. Year:
1996
Page(from):
327
Page(to):
331
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422729 [081942272X]
Language:
English
Call no.:
P63600/2874
Type:
Conference Proceedings

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