Hydrogen Evolution and Surface Morphology of Unannealed and Annealed Hydrogenated Amorphous Silicon Films Deposited in an Asymmetric PECVD System at Room Temperature

Hydrogen Evolution and Surface Morphology of Unannealed and Annealed Hydrogenated Amorphous Silicon Films Deposited in an Asymmetric PECVD System at Room Temperature

Author(s):

Publication title:

Semiconductor Devices

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2733

Pub. Year:

1996

Page(from):

617

Page(to):

619

Pub. info.:

Bellingham, WA — New Delhi: SPIE-The International Society for Optical Engineering — Narosa

ISSN:

0277786X

ISBN:

9780819421142 [0819421146]

Language:

English

Call no.:

P63600/2733

Type:

Conference Proceedings

Details

TDL ID:	ZA00018408
Series ID:	PA00000029

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