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High-resolution microlithography applications of deep-UV excimer lasers (Invited Paper)

Author(s):
Tittel,F.K. ( Rice Univ.USA )
Cavallaro,J.R. ( Rice Univ.USA )
Erdelyi,M. ( JATE University,Hungary )
Szabo,G. ( JATE University,Hungary )
Bor,Zs ( JATE University,Hungary )
Smayling,M.C. ( Texas Instruments,USA )
1 more
Publication title:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference : 25-30 August 1996, Heriot-Watt University, Edinburgh, UK
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3092
Pub. Year:
1997
Page(from):
462
Page(to):
466
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425072 [0819425079]
Language:
English
Call no.:
P63600/3092
Type:
Conference Proceedings

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