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Impact of nitrogen ion implantation on deep submicron SALICIDE process

Author(s):
Lim,C.W, ( National Univ.of Singapore )
Lahiri,S.K. ( National Univ.of Singapore )
Tung,C.H. ( Institute of Microelectronics(Singapore) )
Wong,S.M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Lee,K.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Wong,H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Pey,K.L. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Chan,L.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
3 more
Publication title:
Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3212
Pub. Year:
1997
Page(from):
151
Page(to):
161
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426444 [081942644X]
Language:
English
Call no.:
P63600/3212
Type:
Conference Proceedings

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