Wideband channelized receiver possibilities with 0.18-ヲフm CMOS technology
- Author(s):
- McWillams,J.K. ( Raytheon TI Systems )
- Wentzel,S.W. ( Raytheon TI Systems )
- Publication title:
- Wireless technologies and systems : millimeter-wave and optical : 5 November 1997, Dallas, Texas
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3232
- Pub. Year:
- 1998
- Page(from):
- 44
- Page(to):
- 49
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426659 [0819426652]
- Language:
- English
- Call no.:
- P63600/3232
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Tuned MEDICI simulator including inverse short channel effect for sub-0.18-ヲフm CMOS technologies
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Characterization of gate electrode etch process for 0.25 ヲフm extended to 0.18 ヲフm
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Analysis of Copper and Low-K Dielectric Interconnect System for 0.18-ヲフm Technology
MRS - Materials Research Society |
3
Conference Proceedings
Applicability of RTCVD and LPCVD nitride spacers for sub-0.18-ヲフm CMOS technologies
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Prediction of 0.18-ヲフm CMOS technology performance using tuned device simulation
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Toward a unified advanced CD-SEM specification for sub-0.18-ヲフm technology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Critical issues for developing a high-throughput SCALPEL system for sub-0.18-ヲフm lithography generations
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Customized off-axis illumination aperture filtering for sub-0.18-ヲフm KrF Lithography
SPIE - The International Society for Optical Engineering |