Blank Cover Image

Polymer-bound sensitizer in i-line resist formulations

Author(s):
Jagannathan,P. ( IBM Microelectronics Div. )
DeWan,C. ( IBM Microelectronics Div. )
Eckert,A.R. ( IBM Microelectronics Div. )
Mih,R.D. ( IBM Microelectronics Div. )
Martinek,K. ( IBM Microelectronics Div. )
Richwine,C. ( IBM Microelectronics Div. )
Linehan,L.L. ( IBM Microelectronics Div. )
Moreau,W.M. ( IBM Microelectronics Div. )
Smith,R.S. ( IBM Microelectronics Div. )
4 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 2
Page(from):
1258
Page(to):
1270
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Shot-size reduction of photoresist formulations

W.M. Moreau, K. Cornett, J.T. Fahey, L.L. Linehan, W. Montgomery

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings Resist formulation effects on contrast and top-loss as measured by 3D-SEM metrology

Eckert, A.R., Seiler, C., Brainard, R.L.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Fluorescence detection of photoacid in chemically amplified resists

Eckert,A.R., Moreau,W.M.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Thermal stability of naphthodiazoquinone sensitizers

Moreau,W.M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Investigation into the origin of microbridging in chemically amplified negative-tone photoresists

L.L. Linehan, R.S. Smith, J. Dorn, J.T. Fahey, W.M. Moreau

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Sensitivity factors of CAR electron-beam resists

Medeiros, D.R., Petrillo, K.E., Breyta, G., Huang, W.-S., Moreau, W.M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Acid diffusion in a chemically amplified negative i-line photoresist

Connolly,J., Chen,K.R., Kwong,R.W., Lawson,M., Linehan,L.L., Moreau,W.M.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Characterization of profile dependency on nitride substrate thickness for a chemically amplified i-line negative resist

E.A. Puttlitz, J.P. Collins, T.M. Glynn, L.L. Linehan

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation

M. Plat, W.R. Brunsvold, R.S. Smith, N.K. Eib, C.F. Lyons

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Use of KRS-XE positive chemically amplified resist for optical mask manufacturing

Ashe,B., Deverich,C., Rabidoux,P.A., Peck,B., Petrillo,K.E., Angelopoulos,M., Huang,W.-S., Moreau,W.M., Medeiros,D.R.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Printing various feature types at low k factors with advanced i-line negative resists

Chediak, J. A., Chen, D. Y., Long, D. T., Jagannathan, P., Richwine, C., Benner, L.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings High-resolution patterning in chemically amplified resists: the effect of film thickness

Medeiros,D.R., Moreau,W.M., Petrillo,K.E., Chauhan,M., Huang,W.-S., Magg,C., Goldfarb,D., Angelopoulos,M., Nealey,P.F.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12