New model for the effect of developer temperature on photoresist dissolution
- Author(s):
- Mack,C.A. ( Finle Technologies,Inc. )
- Maslow,M.J. ( Finle Technologies,Inc. )
- Sekiguchi,A. ( Litho Tech Japan )
- Carplo,R.A. ( SEMATECH )
- Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 2
- Page(from):
- 1218
- Page(to):
- 1231
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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