Novolak resin for ultrafast high-resolution positive i-line photoresist compositions

Author(s):

• Rahman,M.D. ( Clariant Corp. )
• Lu,P.-H. ( Clariant Corp. )
• Cook,M.M. ( Clariant Corp. )
• Kim,W.-K. ( Clariant Corp. )
• Khanna,D.N. ( Clariant Corp. )

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 2

Page(from):

1189

Page(to):

1200

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings