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Lithographic and chemical contrast of single-component top-surface imaging (TSI) resists

Author(s):
Bohland,J.R. ( Shipley Co. Inc. )
Chambers,J. ( Intel Corp. )
Das,S. ( Intel Corp. )
Fedynyshyn,T.H. ( Shipley Co. Inc. )
Holl,S.M. ( Intel Corp. )
Hutchinson,J.M. ( Intel Corp. )
Rao,V. ( Intel Corp. )
Sinta,R.F. ( Shipley Co. Inc. )
3 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 2
Page(from):
1009
Page(to):
1016
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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