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Dissolution-rate analysis of ArF resist polymers based on the percolation model

Author(s):
Yamaguchi,A. ( Association of Super-Advanced Electronics Technologies (Japan) )
Kishimura,S. ( Association of Super-Advanced Electronics Technologies (Japan) )
Matsuzawa,N.N. ( Association of Super-Advanced Electronics Technologies (Japan) )
Ohfuji,T. ( Association of Super-Advanced Electronics Technologies (Japan) )
Tanaka,T. ( Osaka Univ.(Japan) )
Tagawa,S. ( Osaka Univ.(Japan) )
Sasago,M. ( Association of Super-Advanced Electronics Technologies (Japan) )
2 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
601
Page(to):
610
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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