Improved positive surface modification resist process for 193-nm lithography
- Author(s):
Endo,M. ( Association of Super-Advanced Electronics Technologies (Japan) ) Matsuo,T. ( Association of Super-Advanced Electronics Technologies (Japan) ) Mori,S. ( Association of Super-Advanced Electronics Technologies (Japan) ) Morisawa,T. ( Association of Super-Advanced Electronics Technologies (Japan) ) Kuhara,K. ( Association of Super-Advanced Electronics Technologies (Japan) ) Sasago,M. ( Association of Super-Advanced Electronics Technologies (Japan) ) Shirai,M. ( Osaka Prefecture Univ.(Japan) ) Tsunooka,M. ( Osaka Prefecture Univ.(Japan) ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 534
- Page(to):
- 545
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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