Novel single-layer photoresist containing cycloolefins for 193 nm
- Author(s):
Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. ) Seo,D.-C. ( Korea Kumho Petrochemical Co.,Ltd. ) Kim,K.-D. ( Korea Kumho Petrochemical Co.,Ltd. ) Park,S.-Y. ( Korea Kumho Petrochemical Co.,Ltd. ) Kim,S.-J. ( Korea Kumho Petrochemical Co.,Ltd. ) Lee,H. ( Korea Kumho Petrochemical Co.,Ltd. ) Jung,J.-C. ( Hyundai Electronics Industries Co.,Ltd. (Korea) ) Bok,C.-K. ( Hyundai Electronics Industries Co.,Ltd. (Korea) ) Baik,K.-H. ( Hyundai Electronics Industries Co.,Ltd. (Korea) ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 454
- Page(to):
- 462
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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