Novel single-layer photoresist containing cycloolefins for 193 nm

Novel single-layer photoresist containing cycloolefins for 193 nm

Author(s):

Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. )

Seo,D.-C. ( Korea Kumho Petrochemical Co.,Ltd. )

Kim,K.-D. ( Korea Kumho Petrochemical Co.,Ltd. )

Park,S.-Y. ( Korea Kumho Petrochemical Co.,Ltd. )

Kim,S.-J. ( Korea Kumho Petrochemical Co.,Ltd. )

Lee,H. ( Korea Kumho Petrochemical Co.,Ltd. )

Jung,J.-C. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )

Bok,C.-K. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )

Baik,K.-H. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )

4 more

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

454

Page(to):

462

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings

Details

TDL ID:	ZA00018317
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1998 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist Kim,S.-J., Park,J.-H., Kim,J.-H., Kim,K.-D., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist Park,J.-H., Kim,J.-Y., Seo,D.-C., Park,S.-Y., Lee,H., Kim,S.-J., Jung,J.-C., Baik,K.-H. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Novel 193-nm single-layer resist containing a multifunctional monomer Lee, G., Koh, C. -W., Jung, J. -C., Jung, M. -H., Kim, H. -S., Baik, K. -H., Choi, I. -H. SPIE - The International Society of Optical Engineering	8 Conference Proceedings High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow Joo, H.S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Song, J.Y., Kim, K.M., Park, J.H., Jung, J.C., Shin, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Novel polymers for 193-nm single-layer resist based on cycloolefin polymers Kim,H.-W., Lee,S.-H., Kwon,K.-Y., Jung,D.-W., Lee,S., Yoon,K.-S., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE - The International Society for Optical Engineering	9 Conference Proceedings ArF photoresist system using alicyclic polymer Park,J.-H., Kim,S.-J., Park,S.-Y., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs Choi,S.-J., Choi,Y.-J., Kim,Y.-S., Kim,S.-D., Kim,D.-B., Kim,J.-H., Koh,C.-W., Lee,G., Jung,J.-C., Baik,K.-H. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Novel 193-nm photoresist based on Olefin-containing lactones Yoon,K.-S., Jung,D.-W., Lee,S., Lee,S.-H., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE-The International Society for Optical Engineering
5 Conference Proceedings New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Organosiloxane based bottom antireflective coatings for 193nm lithography Son, E.-K., Kim, J.-W., Lee, S.-H., Park, C.-S., Lee, J.-W., Kim, J., Lee, G.-S., Lee, S.-K., Ban, K.-D., Jung, J.-C., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist Kim, S.-K., An, I., Oh, H.-K., Lee, S. M., Bok, C. K., Moon, S. C. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Cycloolefin effect in cycloolefin-(meth)acryl copolymer H. S. Lim, D. C. Seo, C. S. Lee, S. W. Park, S. J. Kim Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12