Modeling parameter extraction for DNQ-novolak thick film resists

Author(s):

Henderson,C.L. ( Univ.of Texas at Austin )

Scheer,S.A. ( Univ.of Texas at Austin )

Tsiartas,P.C. ( Univ.of Texas at Austin )

Rathsack,B.M. ( Univ.of Texas at Austin )

Sagan,J.P. ( Clariant Corp. )

Dammel,R.R. ( Clariant Corp. )

Erdmann,A. ( Fraunhofer Institute for Silicon Technology (FRG) )

Willson,C.G. ( Univ.of Texas at Austin )

3 more

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

256

Page(to):

267

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings