Choice of amines as stabilizers for chemically amplified resist systems

Author(s):

• Ferreira,L. ( Olin Microelectronic Materials,Inc. )
• Malik,S. ( Olin Microelectronic Materials,Inc. )
• Sarubbi,T.R. ( Olin Microelectronic Materials,Inc. )
• Blakeney,A.J. ( Olin Microelectronic Materials,Inc. )
• Maxwell,B. ( Olin Microelectronic Materials,Inc. )

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

236

Page(to):

244

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings