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Chemical and lithographic aspects of organic deep-UV BARCs

Author(s):
Padmanaban,M. ( Clariant Japan K.K. )
Kang,W.-B. ( Clariant Japan K.K. )
Kimura,K. ( Clariant Japan K.K. )
Nishiwaki,Y. ( Clariant Japan K.K. )
Pawlowski,C. ( Clariant Japan K.K. )
Tanaka,H. ( Clariant Japan K.K. )
1 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
206
Page(to):
218
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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