Blank Cover Image

Negative-tone TSI process for 193-nm lithography

Author(s):
Kuhara,K. ( Association of Super-Advanced Electronics Technologies (Japan) )
Mori,S. ( Association of Super-Advanced Electronics Technologies (Japan) )
Kaimoto,Y. ( Association of Super-Advanced Electronics Technologies (Japan) )
Morisawa,T. ( Association of Super-Advanced Electronics Technologies (Japan) )
Ohfuji,T. ( Association of Super-Advanced Electronics Technologies (Japan) )
Sasago,M. ( Association of Super-Advanced Electronics Technologies (Japan) )
1 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
188
Page(to):
194
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings High-silicon-concentration TSI process for 193-nm lithography

Mori,S., Morisawa,T., Matsuzawa,N.N., Kaimoto,Y., Endo,M., Matsuo,T., Kuhara,K., Ohfuji,T., Sasago,M.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Effect of the dissolution contrast on the process margin in 193-nm lithography

Takahashi,M., Kishimura,S., Naito,T., Ohfuji,T., Sasago,M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings High-sensitivity silylation process for 193-nm lithography

Mori,S., Kuhara,K., Ohfuji,T., Sasago,M.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Polymer design in surface modification resist process for ArF lithography

Matsuo,T., Endo,M., Mori,S., Kuhara,K., Sasago,M., Shirai,M., Tsunooka,M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Improved positive surface modification resist process for 193-nm lithography

Endo,M., Matsuo,T., Mori,S., Morisawa,T., Kuhara,K., Sasago,M., Shirai,M., Tsunooka,M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Dry etching resistance of methacrylate polymers for ArF excimer laser lithography

Ohfuji,T., Endo,M., Takahashi,M., Naito,T., Tatsumi,T., Kuhara,K., Sasago,M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Recent advantages of bilevel resists based on silsesquioxane for ArF lithography

Morisawa,T., Matsuzawa,N.N., Mori,S., Kaimoto,Y., Endo,M., Ohfuji,T., Kuhara,K., Sasago,M.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Bilayer silylation process for 193-nm lithography

Satou, I., Kuhara, K., Endo, M., Morimoto, H.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Theoretical calculations of silylation reaction of photoresists

Matsuzawa,N.N., Mori,S., Morisawa,T., Kaimoto,Y., Endo,M., Ohfuji,T., Kuhara,K., Sasago,M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Negative-tone cycloolefin photoresist for 193-nm lithography

Fu,S.C., Hsieh,K.H., Wang,L.A.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Acid amplification of chemically amplified resists for 193-nm lithography

Ohfuji,T., Takahashi,M., Kuhara,K., Ogawa,T., Ohtsuka,H., Sasago,M., Ichimura,K.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

Joubert, O. P., Fuard, D., Monget, C., Schiavone, P., Toublan, O., Prola, A., Temerson, J. M., Inglebert, R. L., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12