Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography
- Author(s):
Steinhausler,T. ( Olin Microelectronic Materials,Inc. ) Gabor,A.H. ( Olin Microelectronic Materials,Inc. ) White,D. ( Olin Microelectronic Materials,Inc. ) Blakeney,A.J. ( Olin Microelectronic Materials,Inc. ) Stark,D.R. ( SEMATECH ) Miller,D.A. ( SEMATECH ) Rich,G.K. ( SEMATECH ) Graffenberg,V.L. ( SEMATECH ) Dean,K.R. ( SEMATECH ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 122
- Page(to):
- 131
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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