Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
- Author(s):
Wallow,T.I. ( IBM Almaden Research Ctr. ) Brock,P.J. ( IBM Almaden Research Ctr. ) DiPietro,R.A. ( IBM Almaden Research Ctr. ) Allen,R.D. ( IBM Almaden Research Ctr. ) Opitz,J. ( IBM Almaden Research Ctr. ) Sooriyakumaran,R. ( IBM Almaden Research Ctr. ) Hofer,D.C. ( IBM Almaden Research Ctr. ) Meute,J. ( SEMATECH ) Byers,J.D. ( SEMATECH ) Rich,G.K. ( SEMATECH ) McCallum,M. ( SEMATECH ) Schuetze,S. ( SEMATECH ) Jayaraman,S. ( BFGoodrich ) Hullihen,K. ( BFGoodrich ) Vicari,R. ( BFGoodrich ) Rhodes,L.F. ( BFGoodrich ) Goodall,B.L. ( BFGoodrich ) Shick,R.A. ( BFGoodrich ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 92
- Page(to):
- 101
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists
American Chemical Society |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Approaches to etch-resistant 193-nm photoresists: performance and prospects
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
193-nm negative resist based on acid-catalyzed elimination of polar molecules
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |