Deblocking reaction of chemically amplified ArF positive resists

Author(s):

Yamana,M. ( NEC Corp. (Japan) )

Itani,T. ( NEC Corp. (Japan) )

Yoshino,H. ( NEC Corp. (Japan) )

Hashimoto,S. ( NEC Corp. (Japan) )

Tanabe,H. ( NEC Corp. (Japan) )

Kasama,K. ( NEC Corp. (Japan) )

1 more

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

32

Page(to):

42

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings