High-energy-per-pulse excimer laser for silicon annealing (Invited Paper)
- Author(s):
- Godard,B. ( SOPRA SA (France) )
- Zahorski,D. ( SOPRA SA (France) )
- Publication title:
- High-Power Laser Ablation
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3343
- Pub. Year:
- 1998
- Vol.:
- Part 2
- Page(from):
- 653
- Page(to):
- 660
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427908 [081942790X]
- Language:
- English
- Call no.:
- P63600/3343
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Processing of amorphous silicon flat panel displays with large-area excimer lasers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
CRYSTALLIZATION KINETICS OF HYDROGENATED AMORPHOUS SILICON DURING PULSED EXCIMER LASER ANNEALING
Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Excimer laser annealing system for AMLCDs: a long laser pulse for high-performance uniform stable TFT
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Single Shot Excimer Laser Annealing of Amorphous Silicon: Effect of Hydrogen on the Properties of the Polysilicon
MRS - Materials Research Society |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Single-shot excimer laser annealing:a new tool for poly-AMLCD combined with spectroscopic ellipsometry
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |