Silicon formation at Fe-Si interfaces studied by Mossbauer spectroscopy and Rutherford backscattering

Silicon formation at Fe-Si interfaces studied by Mossbauer spectroscopy and Rutherford backscattering

Author(s):

Cohen, R.L. ( Bell Laboratories )
Feldman, L.C. ( Bell Laboratories )
West, K.W. ( Bell Laboratories )
Silverman, P.J. ( Bell Laboratories )

Publication title:

Nuclear and electron resonance spectroscopies applied to materials science : proceedings of the Materials Research Society Annual Meeting, November 1980, Copley Plaza Hotel, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposia proceedings

Ser. no.:

3

Pub. Year:

1981

Page(from):

357

Page(to):

358

Pub. info.:

New York, N.Y.: North Holland

ISSN:

02729172

ISBN:

9780444005977 [0444005978]

Language:

English

Call no.:

M23500/3

Type:

Conference Proceedings

Details

TDL ID:	ZA00018303
Series ID:	PA00000010
Conf. info. (Name):	Materials Research Society Annual Meeting ; Symposium on nuclear and electron resonance spectroscopies applied to materials science
Conf. info. (Number):	1980
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1980.11.00

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