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FORMAITION OF EPITAXIAL CoSi2 FILMS ON Si ( 111 ) A LOW TEMPERRATURE ( < 400｡？)

Author(s):
Haderbache L.
Wetzel P.
Pirri C.
Peruchetti C. J.
Bolmont D.
Gewinner G.
1 more
Publication title:
Heterostructures on silicon : one step further with silicon
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
160
Pub. Year:
1989
Page(from):
223
Page(to):
229
Pages:
7
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792301240 [0792301242]
Language:
English
Call no.:
N11482/160
Type:
Conference Proceedings

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