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CVD of SiC and AlN Thin Films Using Designed Orfanometallic Precursors

Author(s):
Publication title:
Mechanisms of reactions of organometallic compounds with surfaces
Title of ser.:
NATO ASI series. Series B, Physics
Ser. no.:
198
Pub. Year:
1989
Page(from):
205
Page(to):
212
Pages:
8
Pub. info.:
New York: Plenum Press
ISBN:
9780306432057 [0306432056]
Language:
English
Call no.:
N11479/198
Type:
Conference Proceedings

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