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Properties of ultrathin gate oxides grown in N20-based oxidation ambients by rapid thermal processing

Author(s):
Jia,Y.B. ( Integrated Device Technology )
Pan,O.G.
Wang,L.C.
Lo,P.
Lee,S.K.
Choi,J.Y.
Shih,J.
2 more
Publication title:
In-Line Methods and Monitors for Process and Yield Improvement
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3884
Pub. Year:
1999
Page(from):
112
Page(to):
115
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434814 [0819434817]
Language:
English
Call no.:
P63600/3884
Type:
Conference Proceedings

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