Power scaling of a Z-pinch extreme ultraviolet source

Power scaling of a Z-pinch extreme ultraviolet source

Author(s):: McGeoch,M.W. ( PLEX LLC )
Publication title:: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3997
Pub. Year:: 2000
Page(from):: 861
Page(to):: 866
Pub. info.:: Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819436153 [0819436151]
Language:: English
Call no.:: P63600/3997
Type:: Conference Proceedings

Details

TDL ID:	ZA00018055
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2000 : 4th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.02.28-2000.03.01

Similar Items:

1 Conference Proceedings High-power extreme ultraviolet source based on a Z-pinch McGeoch,M.W. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Extreme-ultraviolet source development: a comparison of different concepts Dusterer,S., Rahe,M., Rebhan,U., Basting,D., Walecki,W.J., Lauth,H., Lebert,R., Bergmann,K., Hoffmann,D., Rosier,O., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Star pinch scalable EUV source McGeoch, M.W., Pike, C.T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography Kubiak,G.D., Bernardez,L.J., Krenz,K.D., Sweatt,W.C. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Power scale-up of the extreme-ultraviolet electric capillary discharge source Fornaciari, N.R., Bender, H., Buchenauer, D., Dimkoff, J.L., Kanouff, M.P., Karim, S., Romeo, C., Shimkaveg, G.M., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Extreme ultraviolet light generation based on laser-produced plasmas(LPP)and gas-discharge-based pinch plasmas:a comparison of different concepts Schriever,G., Rahe,M., Neff,W., Bergmann,K., Lebert,R., Lauth,H., Basting,D. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography Vogt,U., Stiel,H., Will,I., Wieland,M., Wilhein,T., Nickles,P.V., Sandner,W. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Masks for extreme ultraviolet lithography Vernon,S.P., Kearney,P.A., Tong,W.M., Prisbrey,S., Larson,C., Moore,C.E., Weber,F.J., Cardinale,G.F., Yan,P., … SPIE - The International Society for Optical Engineering
5 Conference Proceedings High-power source and illumination system for extreme ultraviolet lithography Kubiak,G.D., Bernardez,L.J., Krenz,K D., Replogle,W.C., Sweatt,W.C., Sweeney,D.W., Hudyma,R.M., Shields,H. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Nano-imaging with compact extreme ultraviolet laser sources Reynolds, G., Hammond, M., Binns, L. A. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Development of a high-average-power extreme-ultraviolet electric capillary discharge source Fornaciari,N.R., Bender,H., Buchenauer,D., Kanouff,M.P., Karim,S., Kubiak,G.D., Moen,C.D., Shimkaveg,G.M., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings High-power extreme-ultraviolet source based on gas jets Kubiak,G.D., Bernardez II,L.J., Krenz,K.D. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12