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EUVL printing results of a low-thermal expansion material(LTEM)mask

Author(s):
Tong,W.M. ( Lawrence Livermore National Lab. )
Taylor,J.S.
Hector,S.D.
Shell,M.M.
Zhang,G.
Kearney,P.A.
Walton,C.C.
Larson,C.
Wasson,J.R.
Mangat,P.J.
O'Connell,D.J.
Folk,D.R.
7 more
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. Year:
2000
Page(from):
855
Page(to):
860
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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