Sub-10nm electron-beam lithography with sub-10-nm overlay accuracy
- Author(s):
- Yamazaki,K. ( NTT Basic Research Labs. )
- Saifullah,M.S.M.
- Namatsu,H.
- Kurihara,K.
- Publication title:
- Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3997
- Pub. Year:
- 2000
- Page(from):
- 458
- Page(to):
- 466
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436153 [0819436151]
- Language:
- English
- Call no.:
- P63600/3997
- Type:
- Conference Proceedings
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