Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography(EPL)

Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography(EPL)

Author(s):

Miyasaka,M. ( NEC Corp. )

Publication title:

Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3997

Pub. Year:

2000

Page(from):

344

Page(to):

351

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436153 [0819436151]

Language:

English

Call no.:

P63600/3997

Type:

Conference Proceedings

Details

TDL ID:	ZA00018055
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2000 : 4th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.02.28-2000.03.01

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