Base-Catalyzed Photosensitive Polyimide

Base-Catalyzed Photosensitive Polyimide

Author(s):

McKean, D. R.

Publication title:

Polymers for microelectronics : resists and dielectrics

Title of ser.:

ACS symposium series

Ser. no.:

537

Pub. Year:

1994

Page(from):

417

Pub. info.:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841227217 [0841227217]

Language:

English

Call no.:

A05800/537

Type:

Conference Proceedings

Details

TDL ID:	ZA00018036
Series ID:	PA00000004
Conf. info. (Name):	National Meeting of the American Chemical Society
Conf. info. (Number):	203rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1992.04.05-1992.04.10

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