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EFFECT OF HOT WATER EXPOSURE ON BARE SILICON SURFACES IN MOS PROCESSING

Author(s):
Eisenberg, J. H.
Shive, S. F.
Stevie, F.
Higashi, G. S.
Boone, T.
Hanson, K.
Sapjeta, J. B.
DiBello, G. N.
Fulford, K. L.
4 more
Publication title:
Surface chemical cleaning and passivation for semiconductor processing
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
315
Pub. Year:
1993
Page(from):
485
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
Language:
English
Call no.:
M23500/315
Type:
Conference Proceedings

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