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EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING

Author(s):
Park, H.-H.
Kwon, K.-H.
Lee, S.-H.
Nahm, S.
Lee, J.-W.
Koak, B.-H.
Suh, K.-S.
Kwon, O.-J.
Lee, J.-L.
Yeom, G.-Y.
5 more
Publication title:
Surface chemical cleaning and passivation for semiconductor processing
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
315
Pub. Year:
1993
Page(from):
243
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
Language:
English
Call no.:
M23500/315
Type:
Conference Proceedings

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