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Ultra Shallow Junction Formation by B+/BF2+ Implantation at Energy of 0.5 keV

Author(s):
Publication title:
Silicon front-end technology--materials processing and modelling, symposium held April 13-15, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
532
Pub. Year:
1998
Page(from):
13
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994386 [1558994386]
Language:
English
Call no.:
M23500/532
Type:
Conference Proceedings

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