Blank Cover Image

Effects of Interstitial Clustering on Transient-Enhanced Diffusion of Boron in Silicon

Author(s):
Publication title:
Microstructure evolution during irradiation : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
439
Pub. Year:
1997
Page(from):
65
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993433 [1558993436]
Language:
English
Call no.:
M23500/439
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Effects of Interstitial Clustering on Transient Enhanced Diffusion of Boron in Silicon

Solmi, S., Valmorri, S.

MRS - Materials Research Society
7 Conference Proceedings RADIATION DAMAGE INDUCED TRANSIENT ENHANCED DIFFUSION OF DOPANTS IN SILICON

Angelucci, R., Gabilli, E., Lotti, R., Negrini, P., Servidori, M., Solmi, S., Anderle, M.

Materials Research Society
2 Conference Proceedings Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion

Cowern, N.E.B., Mannino, G., Roozeboom, F., van Berkum, J.G.M, Colombeau, B., Claverie, A.

Electrochemical Society
8 Conference Proceedings On the Influence of Boron-Interstitial Complexes on Transient Enhanced Diffusion

Stiebel, D., Pichler, P., Ryssel, H.

MRS - Materials Research Society
3 Conference Proceedings Transient-Enhanced Diffusion of Boron in Silicon: The Interstitial Flux

Simpson, T. W., Goldberg, R. D., Mitchell, I. V., Baribeau, J-M.

MRS - Materials Research Society
9 Conference Proceedings An Explanation of Trap-Limited Self-Interstitial Diffusion and Enhanced Boron Clustering in Boron Doped Silicon Super Lattices

Jaeger, H.U.

Electrochemical Society
4 Conference Proceedings Transient Enhanced Diffusion of Boron in Silicon: The Interstitial Flux

Simpson, T. W., Goldberg, R. D., Mitchell, I. V., Baribeau, J-M.

MRS - Materials Research Society
10 Conference Proceedings The Role of Vacancies and Interstitials in Transient-Enhanced Diffusion of Arsenic Implanted Into Silicon

Venables, D., Krishnamoorthy, V., Gossmann, H-J., Lilak, A., Jones, K. S., Jacobson, D. C.

MRS - Materials Research Society
5 Conference Proceedings Atomistic Model of Transient-Enhanced Diffusion and Clustering of Boron in Silicon

Pelaz, L., Gilmer, G. H., Jaraiz, M., Gossmann, H-J., Rafferty, C. S., Eaglesham, D. J., Poate, J. M.

MRS - Materials Research Society
11 Conference Proceedings Formation of Counter Doped Shallow Junctions by Boron and Antimony Implantation and Codiffusion in Silicon

Solmi, S., Canteri, R.

MRS - Materials Research Society
6 Conference Proceedings Experimental Results and Modeling of the Codiffusion of Donors and Acceptors in Si

Solmi, S., Valmorri, S.

MRS - Materials Research Society
12 Conference Proceedings The Source Of Transient Enhanced Diffusion In Sub-KeV Implanted Boron In Crystalline Silicon

Napolitani, Enrico, Carnera, A., Privitera, V., Schroer, E., Marmino, G., Priolo, F., Moffatt, S.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12